Authors

Le, Quoc Toan; Kesters, Els; Prager, Lutz; Lux, Marcel; Vereecke, Guy

Conference

Sematech Surface Preparation and Cleaning Conference - SPCC

Title

Removal of post-etch 193 nm photoresist in porous low-k dielectric patterning using UV irradiation and wet chemistries

Publication type

Proceedings paper

Embargo date

9999-12-31