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Removal of photoresist and BARC in Cu BEOL using an all-wet process
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Authors
Le, Quoc Toan
;
Klipp, Andreas
;
Lux, Marcel
;
Li, Yunlong
;
Zhao, Larry
;
Vereecke, Guy
Conference
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
Title
Removal of photoresist and BARC in Cu BEOL using an all-wet process
Publication type
Proceedings paper
Embargo date
9999-12-31
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