Show simple item record

Oxidation behavior of Ni thin films: application to NiO-based ReRAM

dc.contributor.authorLisoni, Judit
dc.contributor.authorGoux, Ludovic
dc.contributor.authorVerleysen, Eveline
dc.contributor.authorWang, Xin Peng
dc.contributor.authorJurczak, Gosia
dc.contributor.authorWouters, Dirk
dc.date.accessioned2021-10-18T00:06:36Z
dc.date.available2021-10-18T00:06:36Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15729
dc.sourceIIOimport
dc.titleOxidation behavior of Ni thin films: application to NiO-based ReRAM
dc.typeMeeting abstract
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.source.peerreviewno
dc.source.conferenceMRS Spring Meeting Symposium H: Materials and Physics for Nonvolatile Memories
dc.source.conferencedate13/04/2009
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record