Double patterning OPC and design for 22nm to 16nm device nodes
dc.contributor.author | Lucas, Kevin | |
dc.contributor.author | Cork, Chris | |
dc.contributor.author | Miloslavsky, Alex | |
dc.contributor.author | Luk-Pat, Gerry | |
dc.contributor.author | Li, Xiaohai | |
dc.contributor.author | Barnes, Levi | |
dc.contributor.author | Gao, Weimin | |
dc.contributor.author | Wiaux, Vincent | |
dc.date.accessioned | 2021-10-18T00:16:30Z | |
dc.date.available | 2021-10-18T00:16:30Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15762 | |
dc.source | IIOimport | |
dc.title | Double patterning OPC and design for 22nm to 16nm device nodes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Wiaux, Vincent | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | 6th International Symposium on Immersion Lithography Extensions | |
dc.source.conferencedate | 22/10/2009 | |
dc.source.conferencelocation | Prague Czech Republic | |
imec.availability | Published - open access | |
imec.internalnotes | e-proceedings Sematech website |