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Band edge work function metal gates using PEALD TaCN electrodes

dc.contributor.authorMaes, Jan
dc.contributor.authorSwerts, Johan
dc.contributor.authorPierreux, Dieter
dc.contributor.authorMachkaoutsan, Vladimir
dc.contributor.authorMarcus, Steven
dc.contributor.authorMilligan, Brennan
dc.contributor.authorSchram, Tom
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorCacciato, Antonio
dc.contributor.authorRohr, Erika
dc.contributor.authorRothschild, Aude
dc.contributor.authorHendrickx, Paul
dc.contributor.authorBreuil, Laurent
dc.contributor.authorVan den Bosch, Geert
dc.date.accessioned2021-10-18T00:22:44Z
dc.date.available2021-10-18T00:22:44Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15782
dc.sourceIIOimport
dc.titleBand edge work function metal gates using PEALD TaCN electrodes
dc.typeOral presentation
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorPierreux, Dieter
dc.contributor.imecauthorMachkaoutsan, Vladimir
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorHendrickx, Paul
dc.contributor.imecauthorBreuil, Laurent
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecBreuil, Laurent::0000-0003-2869-1651
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.source.peerreviewno
dc.source.conference9th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate20/07/2009
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec


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