Impact of EOT scaling down to 0.85nm on 70nm Ge-pFETs technology with STI

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Authors
Mitard, Jerome; Shea, C.; De Jaeger, Brice; Pristera, Andrea; Wang, Gang; Houssa, Michel; Eneman, Geert; Hellings, Geert; Wang, Wei-E; Lin, J.C.; Leys, Frederik; Loo, Roger; Winderickx, Gillis; Vrancken, Evi; Stesmans, Andre; De Meyer, Kristin; Caymax, Matty; Pantisano, Luigi; Meuris, Marc; Heyns, Marc
Conference
Symposium on VLSI Technology
Title
Impact of EOT scaling down to 0.85nm on 70nm Ge-pFETs technology with STI
Publication type
Proceedings paper
Embargo date
9999-12-31
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