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Newly developed positive-tone resists for Posi/Posi double patterning process

dc.contributor.authorNakamura, Tsuyoshi
dc.contributor.authorTakeshita, Masaru
dc.contributor.authorMaemori, Satoshi
dc.contributor.authorUchida, Ryusuke
dc.contributor.authorTakasu, Ryoichi
dc.contributor.authorOhmori, Katsumi
dc.date.accessioned2021-10-18T01:05:33Z
dc.date.available2021-10-18T01:05:33Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15912
dc.sourceIIOimport
dc.titleNewly developed positive-tone resists for Posi/Posi double patterning process
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceAdvances in Resist Materials and Processing Technolgy XXVI
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7273


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