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Feasibility study of the approach to Flare, shadowing, optical and process corrections for EUVL OPC

dc.contributor.authorNikolsky, Peter
dc.contributor.authorDavydova, Natalia
dc.contributor.authorvan Ingen Schenau, Koen
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorHendrickx, Eric
dc.contributor.authorLorusso, Gian
dc.contributor.authorJiang, Jiong
dc.contributor.authorLiu, Wei
dc.contributor.authorLiu, Huayu
dc.date.accessioned2021-10-18T01:10:07Z
dc.date.available2021-10-18T01:10:07Z
dc.date.issued2009-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15925
dc.sourceIIOimport
dc.titleFeasibility study of the approach to Flare, shadowing, optical and process corrections for EUVL OPC
dc.typeProceedings paper
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorLiu, Wei
dc.contributor.orcidimecLiu, Wei::0000-0002-6573-2881
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage74882N
dc.source.conferencePhotomask Technology 2009
dc.source.conferencedate14/09/2009
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol.7488


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