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Atomic layer deposition of ZrO2, TiO2, and ZrTiO4 thin films

dc.contributor.authorOpsomer, Karl
dc.contributor.authorSchaekers, Marc
dc.contributor.authorRampelberg, G.
dc.contributor.authorDeduytsche, D.
dc.contributor.authorDetavernier, C.
dc.contributor.authorKittl, Jorge
dc.date.accessioned2021-10-18T01:18:03Z
dc.date.available2021-10-18T01:18:03Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15948
dc.sourceIIOimport
dc.titleAtomic layer deposition of ZrO2, TiO2, and ZrTiO4 thin films
dc.typeMeeting abstract
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage2138
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesMeeting ABstracts; Vol. MA2009-02


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