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Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography

dc.contributor.authorOsaki, Mayuka
dc.contributor.authorTanaka, Maki
dc.contributor.authorShishido, Chie
dc.contributor.authorCheng, Shaunee
dc.contributor.authorLaidler, David
dc.contributor.authorErcken, Monique
dc.contributor.authorAltamirano Sanchez, Efrain
dc.date.accessioned2021-10-18T01:20:39Z
dc.date.available2021-10-18T01:20:39Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15954
dc.sourceIIOimport
dc.titlePerformance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography
dc.typeProceedings paper
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage727211
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXIII
dc.source.conferencedate23/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7272


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