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248 nm lithography for the 0.18 μm generation

dc.contributor.authorVandenberghe, Geert
dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorYen, Anthony
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.authorLuehrmann, P.
dc.contributor.authorSlonaker, S.
dc.contributor.authorvan Ingen Schenau, K.
dc.contributor.authorJuffermans, Casper
dc.date.accessioned2021-09-29T15:43:04Z
dc.date.available2021-09-29T15:43:04Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1601
dc.sourceIIOimport
dc.title248 nm lithography for the 0.18 μm generation
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage29
dc.source.endpage42
dc.source.conferenceProceedings of the Microlithography Seminar INTERFACE'96
dc.source.conferencedate27/10/1996
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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