Design of ultra-wideband low-noise amplifiers in 45nm CMOS technology: comparison between planar bulk and SOI FinFET devices

Publication:

2009

Journal article

Author(s)

Ponton, Davide

;

Palestri, P.

;

Esseni, D.

;

Selmi, L.

;

Tiebout, M.

;

;

Siprak, D.

;

Knoblinger, G.

IEEE Transactions on Circuits and Systems I: Regular Papers

1888 since deposited on 2021-10-18

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Acq. date: 2026-04-26