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Millisecond flash lamp annealing of ultrashallow implanted layers in Ge

dc.contributor.authorPosselt, M.
dc.contributor.authorWündisch, C.
dc.contributor.authorSchmidt, B.
dc.contributor.authorSchumann, T.
dc.contributor.authorMücklich, A.
dc.contributor.authorSkorupa, W.
dc.contributor.authorClarysse, Trudo
dc.contributor.authorSimoen, Eddy
dc.contributor.authorHortenbach, H.
dc.date.accessioned2021-10-18T01:52:31Z
dc.date.available2021-10-18T01:52:31Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16046
dc.sourceIIOimport
dc.titleMillisecond flash lamp annealing of ultrashallow implanted layers in Ge
dc.typeMeeting abstract
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage2391
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. MA2009-02


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