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Feasability of TiSi2 and CoSi2 for sub quarter micron processes

dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-29T15:43:46Z
dc.date.available2021-09-29T15:43:46Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1605
dc.sourceIIOimport
dc.titleFeasability of TiSi2 and CoSi2 for sub quarter micron processes
dc.typeOral presentation
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Advanced Metallization and Interconnect Systems for ULSI Applications
dc.source.conferencedate1/10/1996
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec
imec.internalnotesTo be publ. 1997. See C1689


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