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Metrology for implanted Si substrate and dopant loss studies

dc.contributor.authorRadisic, Dunja
dc.contributor.authorShamiryan, Denis
dc.contributor.authorMannaert, Geert
dc.contributor.authorBoullart, Werner
dc.contributor.authorRosseel, Erik
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorMarrant, Koen
dc.contributor.authorBender, Hugo
dc.contributor.authorSonnemans, Roger
dc.contributor.authorBerry, Ivan
dc.date.accessioned2021-10-18T02:03:26Z
dc.date.available2021-10-18T02:03:26Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16073
dc.sourceIIOimport
dc.titleMetrology for implanted Si substrate and dopant loss studies
dc.typeProceedings paper
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage367
dc.source.endpage374
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 25, issue 5


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