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EUV RLS performance tradeoffs for a polymer bound PAG resist process

dc.contributor.authorRathsack, Ben
dc.contributor.authorHooge, Josh
dc.contributor.authorSomervell, Mark
dc.contributor.authorScheer, Steve
dc.contributor.authorNafus, Kathleen
dc.contributor.authorShite, Hideo
dc.contributor.authorBradon, Neil
dc.contributor.authorKitano, Junichi
dc.contributor.authorGronheid, Roel
dc.contributor.authorVaglio Pret, Alessandro
dc.date.accessioned2021-10-18T02:13:22Z
dc.date.available2021-10-18T02:13:22Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16098
dc.sourceIIOimport
dc.titleEUV RLS performance tradeoffs for a polymer bound PAG resist process
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech website


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