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Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects

dc.contributor.authorRathsack, Benjamin
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorKitano, Junichi
dc.contributor.authorGronheid, Roel
dc.contributor.authorVaglio Pret, Alessandro
dc.date.accessioned2021-10-18T02:13:46Z
dc.date.available2021-10-18T02:13:46Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16099
dc.sourceIIOimport
dc.titleResist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage727347
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXVI
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7273


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