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Monitoring of local and global temperature non-uniformities by means of Therma-Probe and Micro Four-Point Probe metrology

dc.contributor.authorRosseel, Erik
dc.contributor.authorPetersen, Dirch
dc.contributor.authorOsterberg, Frederik
dc.contributor.authorHansen, Ole
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorOrtolland, Claude
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorChan, Philip
dc.contributor.authorSalnik, Alex
dc.contributor.authorNicolaides, Lena
dc.date.accessioned2021-10-18T02:29:31Z
dc.date.available2021-10-18T02:29:31Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16140
dc.sourceIIOimport
dc.titleMonitoring of local and global temperature non-uniformities by means of Therma-Probe and Micro Four-Point Probe metrology
dc.typeProceedings paper
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.source.peerreviewno
dc.source.conference17th Annual IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP
dc.source.conferencedate29/09/2009
dc.source.conferencelocationAlbany, NY USA
imec.availabilityPublished - imec


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