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Non-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yield

dc.contributor.authorVanhellemont, Jan
dc.contributor.authorServidori, M.
dc.contributor.authorHiggs, V.
dc.contributor.authorGramenova, Emilia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorJansen, Philippe
dc.date.accessioned2021-09-29T15:45:48Z
dc.date.available2021-09-29T15:45:48Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1616
dc.sourceIIOimport
dc.titleNon-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yield
dc.typeOral presentation
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Extended Defects in Semiconductors - EDS
dc.source.conferencedate8/09/1996
dc.source.conferencelocationGiens France
imec.availabilityPublished - open access


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