Cleaning and strip requirements for metal gate based CMOS integration

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Authors
Schram, Tom; Sebaai, Farid; Claes, Martine; Vos, Rita; Wada, Masayuki; Albert, Johan; Rohr, Erika; Kubicek, Stefan
Conference
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
Title
Cleaning and strip requirements for metal gate based CMOS integration
Publication type
Proceedings paper
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