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Amorphous silicon photonic crystals made with 193nm lithography

dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorBogaerts, Wim
dc.contributor.authorDumon, Pieter
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorBaets, Roel
dc.date.accessioned2021-10-18T02:50:59Z
dc.date.available2021-10-18T02:50:59Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16194
dc.sourceIIOimport
dc.titleAmorphous silicon photonic crystals made with 193nm lithography
dc.typeProceedings paper
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference8th International Photonic & Electromagnetic Crystal Structures Meeting - PECS VIII
dc.source.conferencedate5/04/2009
dc.source.conferencelocationSydney Australia
imec.availabilityPublished - open access
imec.internalnotespaper 179


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