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Mechanisms of film deposition from BCl3-based plasma during dry etching

dc.contributor.authorShamiryan, Denis
dc.contributor.authorEfremov, A.M.
dc.contributor.authorSerlenga, V
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-18T02:55:38Z
dc.date.available2021-10-18T02:55:38Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16205
dc.sourceIIOimport
dc.titleMechanisms of film deposition from BCl3-based plasma during dry etching
dc.typeMeeting abstract
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.beginpageMar-24
dc.source.endpageMar-24
dc.source.conferenceInternational Conference Micro- and Nanoelectronics - ICMNE
dc.source.conferencedate5/10/2009
dc.source.conferencelocationMoscow Russia
imec.availabilityPublished - imec


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