Mechanisms of film deposition from BCl3-based plasma during dry etching
dc.contributor.author | Shamiryan, Denis | |
dc.contributor.author | Efremov, Alexander | |
dc.contributor.author | Serlenga, Vito | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Boullart, Werner | |
dc.date.accessioned | 2021-10-18T02:56:00Z | |
dc.date.available | 2021-10-18T02:56:00Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16206 | |
dc.source | IIOimport | |
dc.title | Mechanisms of film deposition from BCl3-based plasma during dry etching | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.source.peerreview | yes | |
dc.source.conference | International Conference on Micro- and Nano-electronics - ICMNE | |
dc.source.conferencedate | 5/10/2009 | |
dc.source.conferencelocation | Zvenigorod Russia | |
imec.availability | Published - imec |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |