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A novel gap narrowing process for creating high aspect ratio transduction gaps for MEM HF resonators

dc.contributor.authorStoffels, Steve
dc.contributor.authorBryce, George
dc.contributor.authorVan Hoof, Rita
dc.contributor.authorDu Bois, Bert
dc.contributor.authorMertens, Robert
dc.contributor.authorPuers, Bob
dc.contributor.authorTilmans, Harrie
dc.contributor.authorWitvrouw, Ann
dc.date.accessioned2021-10-18T03:24:10Z
dc.date.available2021-10-18T03:24:10Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16274
dc.sourceIIOimport
dc.titleA novel gap narrowing process for creating high aspect ratio transduction gaps for MEM HF resonators
dc.typeProceedings paper
dc.contributor.imecauthorStoffels, Steve
dc.contributor.imecauthorBryce, George
dc.contributor.imecauthorVan Hoof, Rita
dc.contributor.imecauthorDu Bois, Bert
dc.contributor.imecauthorMertens, Robert
dc.contributor.imecauthorPuers, Bob
dc.contributor.imecauthorTilmans, Harrie
dc.contributor.orcidimecDu Bois, Bert::0000-0003-0147-1296
dc.contributor.orcidimecTilmans, Harrie::0000-0003-4240-4962
dc.source.peerreviewno
dc.source.beginpage13 [1139-GG01-05
dc.source.endpage18
dc.source.conferenceMicroelectromechanical Systems - Materials and Devices II
dc.source.conferencedate1/12/2008
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 1139


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