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Screening and evaluation of different wet cleaning solution for post etch residue removal in BEOL applications
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Authors
Suhard, Samuel
;
Claes, Martine
;
Loh, James
;
Vereecke, Guy
;
Pantouvaki, Marianna
;
Demuynck, Steven
;
Vereecke, Bart
;
Beyer, Gerald
Conference
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
Title
Screening and evaluation of different wet cleaning solution for post etch residue removal in BEOL applications
Publication type
Proceedings paper
Embargo date
9999-12-31
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