dc.contributor.author | Suhard, Samuel | |
dc.contributor.author | Claes, Martine | |
dc.contributor.author | Loh, James | |
dc.contributor.author | Vereecke, Guy | |
dc.contributor.author | Pantouvaki, Marianna | |
dc.contributor.author | Demuynck, Steven | |
dc.contributor.author | Vereecke, Bart | |
dc.contributor.author | Beyer, Gerald | |
dc.date.accessioned | 2021-10-18T03:27:29Z | |
dc.date.available | 2021-10-18T03:27:29Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16282 | |
dc.source | IIOimport | |
dc.title | Screening and evaluation of different wet cleaning solution for post etch residue removal in BEOL applications | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Suhard, Samuel | |
dc.contributor.imecauthor | Claes, Martine | |
dc.contributor.imecauthor | Vereecke, Guy | |
dc.contributor.imecauthor | Pantouvaki, Marianna | |
dc.contributor.imecauthor | Demuynck, Steven | |
dc.contributor.imecauthor | Vereecke, Bart | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 101 | |
dc.source.endpage | 107 | |
dc.source.conference | Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11 | |
dc.source.conferencedate | 4/10/2009 | |
dc.source.conferencelocation | Vienna Austria | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol. 25, issue 5 | |