Show simple item record

Screening and evaluation of different wet cleaning solution for post etch residue removal in BEOL applications

dc.contributor.authorSuhard, Samuel
dc.contributor.authorClaes, Martine
dc.contributor.authorLoh, James
dc.contributor.authorVereecke, Guy
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorDemuynck, Steven
dc.contributor.authorVereecke, Bart
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-18T03:27:29Z
dc.date.available2021-10-18T03:27:29Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16282
dc.sourceIIOimport
dc.titleScreening and evaluation of different wet cleaning solution for post etch residue removal in BEOL applications
dc.typeProceedings paper
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorVereecke, Bart
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage101
dc.source.endpage107
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 25, issue 5


Files in this item

Thumbnail
Name:
19287.pdf
Size:
466.5Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record