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Stability of silicon germanium stressors

dc.contributor.authorTomasini, P
dc.contributor.authorMachkaoutsan, Vladimir
dc.contributor.authorThomas, S. G.
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorVerheyen, Peter
dc.date.accessioned2021-10-18T03:40:13Z
dc.date.available2021-10-18T03:40:13Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16315
dc.sourceIIOimport
dc.titleStability of silicon germanium stressors
dc.typeMeeting abstract
dc.contributor.imecauthorMachkaoutsan, Vladimir
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageP2
dc.source.endpageP3
dc.source.conferenceICSI-6: 6th International Conference on Silicon Epitaxy and Heterostructures
dc.source.conferencedate17/05/2009
dc.source.conferencelocationLos Angeles, CA USA
imec.availabilityPublished - open access


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