Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation

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Authors
Tsvetanova, Diana; Vos, Rita; Vereecke, Guy; Clemente, Francesca; Vanstreels, Kris; Conard, Thierry; Vogt, Tatjana; Mertens, Paul; Heyns, Marc
Conference
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
Title
Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Publication type
Proceedings paper
Embargo date
9999-12-31
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