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Evaluation of plasma damage in patterned low-k structures by near-field scanning probe microwave microscope: effect of plasma ash chemistry

dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorTalanov, Vladimir
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-18T03:49:07Z
dc.date.available2021-10-18T03:49:07Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16336
dc.sourceIIOimport
dc.titleEvaluation of plasma damage in patterned low-k structures by near-field scanning probe microwave microscope: effect of plasma ash chemistry
dc.typeProceedings paper
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage134
dc.source.endpage136
dc.source.conferenceIEEE International Interconnect Technology Conference - IITC
dc.source.conferencedate1/06/2009
dc.source.conferencelocationHokkaido Japan
imec.availabilityPublished - imec


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