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High resolution, quantitative depth profiling analysis of nm thin hgh-k dielectriclayers using medium energy ion scattering (MEIS)

dc.contributor.authorvan den Berg, J.A.
dc.contributor.authorReading, M.A.
dc.contributor.authorArmour, D.G>
dc.contributor.authorBailey, P.
dc.contributor.authorNoakes, T.C.Q.
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-18T03:59:30Z
dc.date.available2021-10-18T03:59:30Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16362
dc.sourceIIOimport
dc.titleHigh resolution, quantitative depth profiling analysis of nm thin hgh-k dielectriclayers using medium energy ion scattering (MEIS)
dc.typeProceedings paper
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference19th Ion Beam Analysis Conference - IBA
dc.source.conferencedate7/09/2009
dc.source.conferencelocationCambridge UK
imec.availabilityPublished - imec


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