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Comparison of lithographic performance between MoSi binary mask and MoSi attenuated PSM

dc.contributor.authorYamana, Mitsuharu
dc.contributor.authorLamantia, Matthew
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorWada, Shingo
dc.contributor.authorNagatomo, Tatsuya
dc.contributor.authorTonooka, Yoji
dc.date.accessioned2021-10-18T05:29:06Z
dc.date.available2021-10-18T05:29:06Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16569
dc.sourceIIOimport
dc.titleComparison of lithographic performance between MoSi binary mask and MoSi attenuated PSM
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.beginpage73791L
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XVI
dc.source.conferencedate8/04/2009
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 7379


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