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Optimization of external poly base sheet resistance in 0.13um quasi self-aligned SiGe:C HBTs

dc.contributor.authorYou, Shuzhen
dc.contributor.authorVan Huylenbroeck, Stefaan
dc.contributor.authorNguyen, Duy
dc.contributor.authorSibaja-Hernandez, Arturo
dc.contributor.authorVenegas, Rafael
dc.contributor.authorVan Wichelen, Koen
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-18T05:38:30Z
dc.date.available2021-10-18T05:38:30Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16590
dc.sourceIIOimport
dc.titleOptimization of external poly base sheet resistance in 0.13um quasi self-aligned SiGe:C HBTs
dc.typeMeeting abstract
dc.contributor.imecauthorYou, Shuzhen
dc.contributor.imecauthorVan Huylenbroeck, Stefaan
dc.contributor.imecauthorSibaja-Hernandez, Arturo
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecVan Huylenbroeck, Stefaan::0000-0001-9978-3575
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage99
dc.source.endpage100
dc.source.conferenceAbstracts 6th International Conference on Silicon Epitaxy and Heterostructrues - ICSI-6
dc.source.conferencedate17/05/2009
dc.source.conferencelocationLos Angeles, CA USA
imec.availabilityPublished - open access


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