Show simple item record

dc.contributor.authorZhao, Chao
dc.contributor.authorPawlak, Malgorzata
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorSchaekers, Marc
dc.contributor.authorSleeckx, Erik
dc.contributor.authorVancoille, Eric
dc.contributor.authorWouters, Dirk
dc.contributor.authorTokei, Zsolt
dc.contributor.authorKittl, Jorge
dc.date.accessioned2021-10-18T05:45:09Z
dc.date.available2021-10-18T05:45:09Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16605
dc.sourceIIOimport
dc.titleAtomic layer deposition of Ru and RuO2 for MIMCAP applications
dc.typeProceedings paper
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorVancoille, Eric
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage377
dc.source.endpage387
dc.source.conferenceAtomic Layer Deposition Applications 5
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 25, issue 4


Files in this item

Thumbnail

This item appears in the following collection(s)

Show simple item record