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Fundamental study on the impact of C Co-implantation on ultra shallow B junctions

dc.contributor.authorZschaetzsch, Gerd
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authordel Agua Borniquel, Jose Ignacio
dc.date.accessioned2021-10-18T05:50:30Z
dc.date.available2021-10-18T05:50:30Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16617
dc.sourceIIOimport
dc.titleFundamental study on the impact of C Co-implantation on ultra shallow B junctions
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthordel Agua Borniquel, Jose Ignacio
dc.source.peerreviewno
dc.source.beginpage123
dc.source.endpage126
dc.source.conference9th International Workshop on Junction Technology - IWJT
dc.source.conferencedate11/06/2009
dc.source.conferencelocationKyoto Japan
imec.availabilityPublished - imec


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