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Investigation on the temperature dependence of the dielectric constant of high-k materials for non-volatile memory applications

dc.contributor.authorArreghini, Antonio
dc.contributor.authorSuhane, Amit
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorBreuil, Laurent
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorJurczak, Gosia
dc.contributor.authorVan Houdt, Jan
dc.date.accessioned2021-10-18T15:16:18Z
dc.date.available2021-10-18T15:16:18Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16670
dc.sourceIIOimport
dc.titleInvestigation on the temperature dependence of the dielectric constant of high-k materials for non-volatile memory applications
dc.typeProceedings paper
dc.contributor.imecauthorArreghini, Antonio
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorBreuil, Laurent
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecArreghini, Antonio::0000-0002-7493-9681
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecBreuil, Laurent::0000-0003-2869-1651
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage101
dc.source.endpage104
dc.source.conference11th International Conference on Ultimate Integration on Silicon - ULIS
dc.source.conferencedate17/03/2010
dc.source.conferencelocationGlasgow UK
imec.availabilityPublished - open access


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