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dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorVan Look, Lieve
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorSocha, Robert
dc.contributor.authorBaron, S.
dc.contributor.authorTsai, M.-C.
dc.contributor.authorNing, K.
dc.contributor.authorHsu, S.
dc.contributor.authorLiu, H.Y.
dc.contributor.authorMulder, M.
dc.contributor.authorBouma, A.
dc.contributor.authorvan der Heijden, E.
dc.contributor.authorMouraille, O.
dc.contributor.authorSchreel, K.
dc.contributor.authorFinders, Jo
dc.contributor.authorDusa, Mircea
dc.contributor.authorZimmerman, J.
dc.contributor.authorGraeupner, Paul
dc.contributor.authorNeumann, J.T.
dc.contributor.authorHennerkes, C.
dc.date.accessioned2021-10-18T15:19:22Z
dc.date.available2021-10-18T15:19:22Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16724
dc.sourceIIOimport
dc.titleFreeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage764008
dc.source.conferenceOptical Microlithography XXIII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesSPIE Proceedings; Vol.7640


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