The mechanism of low-k SiOCH film modification by oxygen atoms

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Authors

Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M.; Baklanov, Mikhaïl

ISSN

0021-8979

Issue

7

Journal

Journal of Applied Physics

Volume

108

Title

The mechanism of low-k SiOCH film modification by oxygen atoms

Publication type

Journal article

Embargo date

9999-12-31

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