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The influence of the angle of incidence in megasonic cleaning

dc.contributor.authorBrems, Steven
dc.contributor.authorHauptmann, Marc
dc.contributor.authorCamerotto, Elisabeth
dc.contributor.authorXu, XiuMei
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-18T15:26:17Z
dc.date.available2021-10-18T15:26:17Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16799
dc.sourceIIOimport
dc.titleThe influence of the angle of incidence in megasonic cleaning
dc.typeMeeting abstract
dc.contributor.imecauthorBrems, Steven
dc.contributor.imecauthorCamerotto, Elisabeth
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage25
dc.source.endpage26
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate19/09/2010
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access


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