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Development, optimization and evaluation of a CF4 pretreatment process to remove unwanted interfacial layers in stacks of CVD and PECVD polycrystalline silicon-germanium for MEMS applications
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1914 since deposited on 2021-10-18
Acq. date: 2025-10-24
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1914 since deposited on 2021-10-18
Acq. date: 2025-10-24
Citations