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Development, optimization and evaluation of a CF4 pretreatment process to remove unwanted interfacial layers in stacks of CVD and PECVD polycrystalline silicon-germanium for MEMS applications

dc.contributor.authorBryce, George
dc.contributor.authorSeveri, Simone
dc.contributor.authorVan Hoof, Rita
dc.contributor.authorGuo, Bin
dc.contributor.authorKunnen, Eddy
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorDecoutere, Stefaan
dc.date.accessioned2021-10-18T15:27:31Z
dc.date.available2021-10-18T15:27:31Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16810
dc.sourceIIOimport
dc.titleDevelopment, optimization and evaluation of a CF4 pretreatment process to remove unwanted interfacial layers in stacks of CVD and PECVD polycrystalline silicon-germanium for MEMS applications
dc.typeProceedings paper
dc.contributor.imecauthorBryce, George
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorVan Hoof, Rita
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.source.peerreviewno
dc.source.beginpage79
dc.source.endpage90
dc.source.conferenceSensors, Actuators, and Microsystems (General)
dc.source.conferencedate25/04/2010
dc.source.conferencelocationVancouver Canada
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 28; Issue 20


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