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LENS - Lithography enhancement towards nano scale

dc.contributor.authorCantu, Pietro
dc.contributor.authorBaldi, Livio
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorPiacentini, Paolo
dc.contributor.authorFliervoet, Timon
dc.contributor.authorAlberga, Gerold
dc.contributor.authorLe Gratiet, Bertrand
dc.contributor.authorGaugiran, Stephanie
dc.contributor.authorWong, Patrick
dc.contributor.authorMiyashita, Hiroyuki
dc.contributor.authorAtzei, Luisa Rita
dc.contributor.authorBuch, Xavier
dc.contributor.authorVerkleiji, Dick
dc.contributor.authorToublan, Olivier
dc.contributor.authorPerez Murano, Francesc
dc.contributor.authorMecerreyes, David
dc.date.accessioned2021-10-18T15:28:57Z
dc.date.available2021-10-18T15:28:57Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16821
dc.sourceIIOimport
dc.titleLENS - Lithography enhancement towards nano scale
dc.typeOral presentation
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.imecauthorWong, Patrick
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceEuropean Nanoelectronics Forum
dc.source.conferencedate16/11/2010
dc.source.conferencelocationMadrid Spain
imec.availabilityPublished - open access


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