dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | Lazzarino, Frederic | |
dc.contributor.author | Goossens, Danny | |
dc.contributor.author | Conard, Thierry | |
dc.contributor.author | Hoflijk, Ilse | |
dc.contributor.author | Shamiryan, Denis | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | Boullart, Werner | |
dc.date.accessioned | 2021-10-18T15:49:26Z | |
dc.date.available | 2021-10-18T15:49:26Z | |
dc.date.issued | 2010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16952 | |
dc.source | IIOimport | |
dc.title | The metal hard-mask approach for contact patterning | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.imecauthor | Goossens, Danny | |
dc.contributor.imecauthor | Conard, Thierry | |
dc.contributor.imecauthor | Hoflijk, Ilse | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 752106 | |
dc.source.conference | International Conference on Micro- and Nanoelectronics 2009 | |
dc.source.conferencedate | 5/10/2009 | |
dc.source.conferencelocation | Moscow Russia | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 7521 | |