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Chemisorption reaction mechanisms for atomic layer deposition of high-k oxides on high mobility channel materials

dc.contributor.authorDelabie, Annelies
dc.contributor.authorSioncke, Sonja
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorCaymax, Matty
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorPierloot, Kristine
dc.date.accessioned2021-10-18T15:59:11Z
dc.date.available2021-10-18T15:59:11Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17005
dc.sourceIIOimport
dc.titleChemisorption reaction mechanisms for atomic layer deposition of high-k oxides on high mobility channel materials
dc.typeProceedings paper
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.source.peerreviewyes
dc.source.beginpage343
dc.source.endpage353
dc.source.conferenceAtomic Layer Deposition Applications 6
dc.source.conferencedate10/10/2010
dc.source.conferencelocationLas Vegas, NV USA
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 33, Issue 2


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