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Quantifying LER and its impact on BEOL TDDB reliability at 20nm ½ pitch

dc.contributor.authorDemuynck, Steven
dc.contributor.authorRoussel, Philippe
dc.contributor.authorStucchi, Michele
dc.contributor.authorVersluijs, Janko
dc.contributor.authorGishia, Gianni
dc.contributor.authorTokei, Zsolt
dc.contributor.authorDe Roest, David
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-18T16:00:19Z
dc.date.available2021-10-18T16:00:19Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17010
dc.sourceIIOimport
dc.titleQuantifying LER and its impact on BEOL TDDB reliability at 20nm ½ pitch
dc.typeProceedings paper
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.source.peerreviewyes
dc.source.conferenceIEEE International Interconnect Technology Conference - IITC
dc.source.conferencedate7/06/2010
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec


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