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Challenges in setting up the patterning processes for a 16nm node SRAM cell

dc.contributor.authorErcken, Monique
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorVersluijs, Janko
dc.contributor.authorTruffert, Vincent
dc.contributor.authorDe Backer, Johan
dc.contributor.authorDelvaux, Christie
dc.contributor.authorBaerts, Christina
dc.date.accessioned2021-10-18T16:15:36Z
dc.date.available2021-10-18T16:15:36Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17079
dc.sourceIIOimport
dc.titleChallenges in setting up the patterning processes for a 16nm node SRAM cell
dc.typeOral presentation
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorDe Backer, Johan
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorBaerts, Christina
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceFujifilm Advanced Lithography Workshop
dc.source.conferencedate16/09/2010
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - open access


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