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Litho and patterning challenges for memory and logic applications at the 22nm node

dc.contributor.authorFinders, Jo
dc.contributor.authorDusa, Mircea
dc.contributor.authorNikolsky, Peter
dc.contributor.authorVan Dommelen, Youri
dc.contributor.authorWatso, Robert
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorVan Look, Lieve
dc.date.accessioned2021-10-18T16:21:42Z
dc.date.available2021-10-18T16:21:42Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17104
dc.sourceIIOimport
dc.titleLitho and patterning challenges for memory and logic applications at the 22nm node
dc.typeProceedings paper
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage76400C
dc.source.conferenceOptical Microlithography XXIII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7640


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