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Analog performance of SOI FinFETs with different TiN gate electrode thickness

dc.contributor.authorGaleti, M.
dc.contributor.authorRodrigues, M.
dc.contributor.authorCollaert, Nadine
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.authorMartino, J.A.
dc.date.accessioned2021-10-18T16:26:36Z
dc.date.available2021-10-18T16:26:36Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17123
dc.sourceIIOimport
dc.titleAnalog performance of SOI FinFETs with different TiN gate electrode thickness
dc.typeProceedings paper
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage58
dc.source.endpage66
dc.source.conferenceMicroelectronics Technology and Devices - SBMICRO 2010
dc.source.conferencedate6/09/2010
dc.source.conferencelocationSao Paulo Brazil
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 31, Iss.1


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