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field evaporation behavior of high-k metal gate stack under femtosecond laser pulsing

dc.contributor.authorGilbert, Matthieu
dc.contributor.authorKoelling, Sebastian
dc.contributor.authorKambham, Ajay Kumar
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-18T16:33:37Z
dc.date.available2021-10-18T16:33:37Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17150
dc.sourceIIOimport
dc.titlefield evaporation behavior of high-k metal gate stack under femtosecond laser pulsing
dc.typeOral presentation
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.conference52nd International Field Emission Symposium - IFES
dc.source.conferencedate5/07/2010
dc.source.conferencelocationSydney Australia
imec.availabilityPublished - imec


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