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EUV resist material performance, progress and process improvements at imec

dc.contributor.authorGoethals, Mieke
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorBan, Keundo
dc.contributor.authorHosokawa, Kohei
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorPollentier, Ivan
dc.contributor.authorJehoul, Christiane
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-18T16:35:20Z
dc.date.available2021-10-18T16:35:20Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17157
dc.sourceIIOimport
dc.titleEUV resist material performance, progress and process improvements at imec
dc.typeProceedings paper
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate17/10/2010
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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