dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Vanhaelemeersch, Serge | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-09-30T07:55:36Z | |
dc.date.available | 2021-09-30T07:55:36Z | |
dc.date.issued | 1997 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1717 | |
dc.source | IIOimport | |
dc.title | Feasibility of TiSi2 and CoSi2 for sub quarter micron processes: problems of the etch selectivity | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 199 | |
dc.source.endpage | 203 | |
dc.source.conference | Advanced Metallization and Interconnect Systems for ULSI Applications in 1996 | |
dc.source.conferencedate | 1/10/1996 | |
dc.source.conferencelocation | Boston, MA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Parallel session held in Tokio 23-24 october 1996 | |